Title:
ILLUMINATING OPTICAL SYSTEM, ILLUMINATION METHOD, EXPOSURE METHOD, AND EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2014239088
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To reduce the effect of a speckle pattern on the surface to be irradiated when light having high coherence is used.SOLUTION: Disclosed is an illuminating optical system ILS which irradiates a reticle surface Ra with illumination light IL from a light source 10. This system ILS includes: a diffraction optical element 13A which changes angle distribution of light from the light source 10 and emits the light; a condensing optical system 17 which converts the angle distribution of the light emitted from the diffraction optical element 13A into position distribution by an incidence plane 20I of a MFL (micro fly eye lens) 20; the MFL 20 arranged in an optical path of the light via the condensing optical system 17; and a luminous flux shift optical system 14 which is arranged between the diffraction optical element 13A and the condensing optical system 17, and shifts the light emitted from the diffraction optical element 13A while irregularly changing the shift amount in an almost continuous manner in the direction vertical to an optical axis AXI of the illuminating optical system ILS.
Inventors:
ICHIHARA YUTAKA
KOMATSUDA HIDEKI
WATANABE YOJI
INOUE KAORU
KOMATSUDA HIDEKI
WATANABE YOJI
INOUE KAORU
Application Number:
JP2013119339A
Publication Date:
December 18, 2014
Filing Date:
June 05, 2013
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Omori 聡
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