To provide an illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with illumination light in a predetermined polarized state.
Am illumination optical system (ILS) for illuminating a reticle (R) with illumination light (IL) and a projection optical system for projecting a pattern image of the reticle (R) onto a wafer (W) are provided. Illumination light (IL) emitted from an exposure light source (1) in a linearly polarized state in the illumination optical system (ILS) passes through first and second birefringent members (12, 13) having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and then illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).
JPH09184918A | 1997-07-15 | |||
JP2003035822A | 2003-02-07 | |||
JPH05283317A | 1993-10-29 | |||
JP2001274083A | 2001-10-05 | |||
JP2000114157A | 2000-04-21 | |||
JP2002520810A | 2002-07-09 | |||
JPH07183201A | 1995-07-21 | |||
JP2002289505A | 2002-10-04 | |||
JP2002231619A | 2002-08-16 | |||
JPH09184918A | 1997-07-15 | |||
JP2003035822A | 2003-02-07 | |||
JPH05283317A | 1993-10-29 | |||
JP2001274083A | 2001-10-05 | |||
JP2000114157A | 2000-04-21 | |||
JP2002520810A | 2002-07-09 | |||
JPH07183201A | 1995-07-21 | |||
JP2002289505A | 2002-10-04 | |||
JP2002231619A | 2002-08-16 | |||
JP2004103746A | 2004-04-02 |
WO2000067303A1 | 2000-11-09 | |||
WO2003003429A1 | 2003-01-09 | |||
WO2003003429A1 | 2003-01-09 | |||
WO2000067303A1 | 2000-11-09 | |||
WO2001035451A1 | 2001-05-17 | |||
WO2001023935A1 | 2001-04-05 | |||
WO2005005694A1 | 2005-01-20 |
Shiro Terasaki