Title:
ILLUMINATION OPTICAL DEVICE AND PROJECTION EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2016053718
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.SOLUTION: An illumination optical device includes: an illumination optical system ILS which lights up a reticle R with illumination light IL; and a projection optical system which projects an image of a pattern of the reticle R on a wafer W. In the illumination optical device ILS, the illumination light IL emitted from an exposure light source 1 in a linear polarized state passes through a first and a second birefringent members 12 and 13 having different directions of phase advance axes to be converted into a polarized state of substantially linear polarized light in a circumferential direction around an optical axis in a substantially specified annular region, and then passes through a fly eye lens 14 etc., to light up the reticle R under a condition of annular illumination.SELECTED DRAWING: Figure 1
Inventors:
SHIRAISHI NAOMASA
Application Number:
JP2015198071A
Publication Date:
April 14, 2016
Filing Date:
October 05, 2015
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; G02B5/18; G02B5/30; G02B19/00; H01L21/027
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Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Hiroshi Otani
Kobayashi Hideyoshi
Shinji Kato
Hiroshi Otani