Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ILLUMINATION OPTICAL DEVICE AND PROJECTION EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2018116279
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical device and a projection exposure device capable of decreasing a loss of light quantity when a mask is illuminated with illumination light in a predetermined polarization state.SOLUTION: The projection exposure device includes an illumination optical system (ILS) for illuminating a reticle (R) with illumination light (IL) and a projection optical system for projecting a pattern image of the reticle (R) onto a wafer (W). In the illumination optical system (ILS), the illumination light (IL) in a linearly polarized state emitted from an exposure light source (1) passes through first and second birefringence members (12, 13) which have different directions of phase advanced axes, and is converted, in a specified annular region, into a polarization state that is substantially linearly polarized light in a circumferential direction with the optical axis as the center, and then the illumination light passes through a fly-eye lens (14) or the like and illuminates the reticle (R) under an annular illumination condition.SELECTED DRAWING: Figure 1

Inventors:
SHIRAISHI NAOMASA
Application Number:
JP2018009819A
Publication Date:
July 26, 2018
Filing Date:
January 24, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORP
International Classes:
G03F7/20; G02B5/18; G02B5/30; G02B19/00; H01L21/027
Domestic Patent References:
JP4543331B22010-09-15
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka