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Title:
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE METHOD FOR MANUFACTURING
Document Type and Number:
Japanese Patent JP2009260342
Kind Code:
A
Abstract:

To provide an illumination optical system capable of uniformly adjusting a pupil intensity distribution at each point on a surface to be irradiated.

This illumination optical system to illuminate the surface to be irradiated (M; W) with light from a light source 1 includes a distribution forming optical system 3, 4, 7, 8 having an optical integrator 8 and forming the pupil intensity distribution on an illumination pupil located at the backside of the optical integrator, and a transmission filter 9 having transmittance characteristics varying depending upon an angle of incidence of light, which is disposed in an illumination pupil space between an optical element having a power adjacent to the front of the illumination pupil and an optical element having a power adjacent to the backside of the illumination pupil and which is disposed at a position where light passing through only a part of the region of the illumination pupil or light having passed through only a part of the region of the illumination pupil enters.


Inventors:
MORI KOJI
TANAKA HIROHISA
Application Number:
JP2009093951A
Publication Date:
November 05, 2009
Filing Date:
April 08, 2009
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G02B5/00; H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
JP2009267400A2009-11-12
JPH07211617A1995-08-11
JPH05283317A1993-10-29
JP2001085315A2001-03-30
JP2006019702A2006-01-19
JP2009267400A2009-11-12
JPH07211617A1995-08-11
JPH05283317A1993-10-29
Attorney, Agent or Firm:
Takao Yamaguchi



 
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