ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF, AND DEVICE MANUFACTURING METHOD

Japanese Patent JP2015046601

A

PROBLEM TO BE SOLVED: To provide an illumination optical system which can realize illumination conditions rich in variety and can improve device productivity when it is applied to an exposure apparatus.SOLUTION: The illumination optical system is designed to illuminate an irradiated surface on the basis of light from a light source (1), comprising: a first optical path in which a diffraction optical element (6) is disposed at a first position thereof; a second optical path in which a spatial light modulator (3) including a plurality of optical elements (3a) two dimensionally arrayed and individually controlled is disposed at a second position thereof; and a third optical path which is a path for light having passed through at least one side of the first optical path and the second optical path, in which a distribution formation optical system (11) is disposed. The distribution formation optical system (11) forms a designated distribution of light intensity at an illumination pupil located in the third optical path on the basis of the light having passed through at least one side of the first and the second optical paths.

TANITSU OSAMU

JP2014186426A

March 12, 2015

September 12, 2014

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NIKON CORP

H01L21/027; G02B3/00; G02B3/06; G02B19/00; G03F7/20

JP2001176766A	2001-06-29
JP2003022967A	2003-01-24
JP2002353105A	2002-12-06
JP2004247737A	2004-09-02
JP2009093175A	2009-04-30
JP5262063B2	2013-08-14
JP2007505488A	2007-03-08

WO2010016288A1	2010-02-11
US20060050261A1	2006-03-09

Seiji Ono
Eiryou Kobayashi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani

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