To provide an illumination optical system for a microlithographic projection exposure apparatus.
An illumination optical system for a microlithographic projection exposure apparatus (1) is used for illuminating an object surface (19) with illumination light (3, 3') emitted from light sources (2, 2'). At least two individual optical modules (28, 29) are used so as to set at least two illumination settings in a pupil surface (12) of the illumination optical system. A separation element (9), which is located at a light path on an upstream side of the optical modules, optionally sends the illumination light (3, 3') to the first optical module (28) and/or the second optical module (29). A coupling element (35), which is located at a light path on a downstream side of the two optical modules (28, 29), sends the illumination light (3, 3') which has passed through the first optical module (28) and/or the second optical module (29) to an illumination region. Thus, an illumination system having the illumination optical system and the light sources is realized, which makes it possible to switch over the different illumination settings at a high speed.
| JP2000021751A | 2000-01-21 | |||
| JP2005167254A | 2005-06-23 | |||
| JP2000031028A | 2000-01-28 | |||
| JP2005236088A | 2005-09-02 | |||
| JP2005093522A | 2005-04-07 | |||
| JP2003100626A | 2003-04-04 | |||
| JP2000021748A | 2000-01-21 | |||
| JP2004501384A | 2004-01-15 | |||
| JP2007287760A | 2007-11-01 |
| US20070146676A1 | 2007-06-28 | |||
| WO2008007632A1 | 2008-01-17 |
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda