Title:
ILLUMINATION OPTICS FOR EUV PROJECTION MICROLITHOGRAPHY, ILLUMINATION SYSTEM INCLUDING ILLUMINATION OPTICS, PROJECTION ALIGNER INCLUDING ILLUMINATION SYSTEM, METHOD OF MANUFACTURING MICROSTRUCTURE ELEMENT, AND MICROSTRUCTURE ELEMENT OBTAINED BY ITS METHOD
Document Type and Number:
Japanese Patent JP2008135743
Kind Code:
A
Abstract:
To provide an illumination optical system which can switch some illumination settings with a few technical efforts.
In a projection aligner for EUV projection microlithography, the illumination optical system includes a field facet mirror having a plurality of field facets so as to generate secondary light sources, and a plurality of pupil facet mirrors disposed at the locations of the secondary light sources generated by the field facet mirror. The field facet mirror is divided into sub units having the field facets including at least a field facet 11. The illumination optical system includes an exchanging device for exchanging at least one of the sub units of the field facet mirror with at least an exchangeable sub unit.
Inventors:
WARM BERNDT
DENGEL GUENTHER
DENGEL GUENTHER
Application Number:
JP2007300430A
Publication Date:
June 12, 2008
Filing Date:
November 20, 2007
Export Citation:
Assignee:
ZEISS CARL SMT AG
International Classes:
H01L21/027; B81C99/00; G02B19/00; G03F7/20
Domestic Patent References:
| JP2006523944A | 2006-10-19 | |||
| JP2006140504A | 2006-06-01 | |||
| JP2002203784A | 2002-07-19 | |||
| JP2005032972A | 2005-02-03 | |||
| JP2006523944A | 2006-10-19 | |||
| JP2006140504A | 2006-06-01 |
Foreign References:
| US20050111067A1 | 2005-05-26 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa