Title:
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY AND ILLUMINATION OPTICAL UNIT
Document Type and Number:
Japanese Patent JP2020073949
Kind Code:
A
Abstract:
To provide an illumination optical unit for EUV projection lithography which functions to guide illumination light toward an object visual field.SOLUTION: A visual field facet mirror of an illumination optical unit has a plurality of individual mirrors capable of performing switching between at least two inclination positions, a pupil faucet mirror of the illumination optical unit has a plurality of stationary pupil faucets and is arranged on the downstream of the visual field faucet mirror in a beam path of the illumination light. The pupil faucets function for at least sectional overlapping image formation of a group of the individual mirrors of the visual field faucet mirrors into the object visual field through the group mirror illumination channel, at least a part of the individual mirrors is arranged in a change section (36) of the visual field faucet mirror, and the individual mirrors in the change section (36) can be allocated to two different individual mirror groups (25a and 25b) imaged in the object visual field through the different pupil faucets on the basis of the individual mirror inclination position.SELECTED DRAWING: Figure 3
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Inventors:
MARTIN ENDRES
Application Number:
JP2019159617A
Publication Date:
May 14, 2020
Filing Date:
September 02, 2019
Export Citation:
Assignee:
ZEISS CARL SMT GMBH
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2012244184A | 2012-12-10 | |||
| JP2002203784A | 2002-07-19 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Naoki Kondo
Hiroshi Oura
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Naoki Kondo
Hiroshi Oura