Title:
ＥＵＶ投影リソグラフィのための照明系及び照明光学ユニット
Document Type and Number:
Japanese Patent JP6620088
Kind Code:
B2
Abstract:
An illumination optical unit for EUV projection lithography guides illumination light toward an object field. A field facet mirror of the illumination optical unit has a multiplicity of individual mirrors which are switchable between at least two tilting positions. A pupil facet mirror of the illumination optical unit has a plurality of stationary pupil facets and is disposed downstream of the field facet mirror in the beam path of the illumination light. The pupil facets serve for the at least sectionally superimposing imaging of a group of the individual mirrors of the field facet mirror into the object field via a group-mirror illumination channel.
Inventors:
Endless Martin
Application Number:
JP2016515545A
Publication Date:
December 11, 2019
Filing Date:
August 25, 2014
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B13/24; G02B17/06
Domestic Patent References:
| JP2003022967A | ||||
| JP2012169634A | ||||
| JP2006128321A | ||||
| JP2011512659A | ||||
| JP2012178573A | ||||
| JP2013503460A | ||||
| JP2012530367A | ||||
| JP2011077142A |
Foreign References:
| US20120069313 | ||||
| US20100141918 |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura