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Title:
ILLUMINATION SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2008277815
Kind Code:
A
Abstract:

To enable, in a flexible mode, substantial or complete elimination of an unwanted preferential polarization orientation even upon a variation in the illumination setting.

The polarization-influencing arrangement 10 includes: a first wedge plate 11 having a first wedge direction which extends perpendicularly to the optical axis OA in the direction of a maximum change in thickness of the first wedge plate; and a second wedge plate 12 having a second wedge direction which extends perpendicularly to the optical axis in the direction of a maximum change in thickness of the second wedge plate, in which the first wedge plate and the second wedge plate are arranged rotatably around the optical axis and made from birefringent crystal materials having individual optical crystal axes, respectively, with the optical crystal axis of the first wedge plate and that of the second wedge plate being oriented at an angle of 45 3 relative to each other at the starting points of the device, from which the first wedge direction and the second wedge direction extend in parallel relationship to each other. One of the two crystal axes is oriented perpendicularly or parallel to the preferential polarization orientation for the light incident onto the device.


Inventors:
FIOLKA DAMIAN
Application Number:
JP2008109919A
Publication Date:
November 13, 2008
Filing Date:
April 21, 2008
Export Citation:
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Assignee:
ZEISS CARL SMT AG
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
JP2002520810A2002-07-09
JP2005333001A2005-12-02
JP2003090978A2003-03-28
JP2005156592A2005-06-16
JP2002520810A2002-07-09
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda