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Title:
ILLUMINATION SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2012212890
Kind Code:
A
Abstract:

To provide an illumination system of a microlithographic projection exposure apparatus.

An illumination system comprises: a mirror arrangement 140 having a plurality of mirror units 141, 142, 143 displaceable independently of one another for altering an angle distribution of light reflected by the mirror arrangement 140; and at least one element 130 arranged in front of the mirror arrangement 140 in the light propagation direction for producing at least two different states of polarization incident on different mirror units.


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Inventors:
DAMIAN FIOLKA
DANIEL WALLDORF
INGO SAENGER
Application Number:
JP2012117571A
Publication Date:
November 01, 2012
Filing Date:
May 23, 2012
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B19/00; G02B30/25; G03F7/20
Domestic Patent References:
JP2007227918A2007-09-06
JP2007189079A2007-07-26
JP2007524247A2007-08-23
JP2005509184A2005-04-07
JP2002520810A2002-07-09
JP2007227918A2007-09-06
JP2007189079A2007-07-26
JP2007524247A2007-08-23
JP2005509184A2005-04-07
JP2002520810A2002-07-09
Foreign References:
WO2005041277A12005-05-06
WO2005041277A12005-05-06
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi



 
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