Title:
ILLUMINATOR LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM COMPRISING SUCH ILLUMINATOR, AND MANUFACTURING METHOD USING SUCH LITHOGRAPHY SYSTEM
Document Type and Number:
Japanese Patent JP3877517
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an improved lithography projection system which has a small number of components low bulk, and therefore inexpensive manufacturing cost, and is equipped with an illuminator of high transmission efficiency despite short wavelength.
SOLUTION: An illuminator to control radiation beams for a lithography projection system comprises a plurality of optical devices 10 and an exchanger 12 to draw this optical device in and out of its beam path. The intensity distribution of beams in the pupil plane 16 of this illuminator is determined by this optical device. Exchange of different optical devices by this exchanger provides different illuminance settings (intensity distributions) with no need of zoom axicons, so that the number of components and that of junction boundaries decrease and therefore manufacturing cost, resulting in an improvement in transmission efficiency.
Inventors:
Marx, Oil Links
Yang Jap, Clicke
Yang Jap, Clicke
Application Number:
JP2000377332A
Publication Date:
February 07, 2007
Filing Date:
December 12, 2000
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G02B5/18; H01L21/027; G02B3/00; G02B3/08; G02B5/32; G02B19/00; G03F7/20; (IPC1-7): H01L21/027; G02B3/00; G02B3/08; G02B5/18; G02B5/32; G02B19/00; G03F7/20
Domestic Patent References:
| JP7263313A | ||||
| JP7201697A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yukio Iwamoto
Hajime Asamura
Toru Mori
Yukio Iwamoto