Title:
IMAGE EXPOSURE DEVICE AND IMAGE EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2003066540
Kind Code:
A
Abstract:
To provide an image exposure device for accurately exposing images with high resolution in a wide area, without the occurrence of an image distortion and irregularities in image due to a distortion of lenses for a collimating lens optical system and a focusing lens optical system in the case of imaging and exposing an image formed by a light source group on a recording medium through the collimating lens optical system and the focusing lens optical system.
The optical systems whose distortion characteristics agree with each other are used in the collimating lens optical system 22 and the focusing lens optical system 24, and the image is formed on the recording medium and exposed by using the optical systems.
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Inventors:
SUMI KATSUTO
OMORI TOSHIHIKO
SUNAKAWA HIROSHI
OMORI TOSHIHIKO
SUNAKAWA HIROSHI
Application Number:
JP2001255952A
Publication Date:
March 05, 2003
Filing Date:
August 27, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B41J2/445; G02B5/08; G02B13/00; G02B17/08; G02B26/08; G03B27/32; H04N1/036; H04N1/113; (IPC1-7): G03B27/32; B41J2/445; G02B5/08; G02B13/00; G02B17/08; G02B26/08; H04N1/036; H04N1/113
Attorney, Agent or Firm:
Noboru Watanabe (2 outside)
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