To provide an SEM device or an SEM system improved in inspection efficiency and the rate of automation by allowing an imaging recipe or/and a measurement recipe to be automatically and rapidly generated; and its method.
This imaging recipe and measurement recipe generation method in an SEM device or an SEM system is characterized by including: an evaluation step of evaluating an acceptable value of an imaging position displacement amount at an evaluation point in a recipe calculation part; an evaluation step of evaluating an estimation value of the imaging position displacement amount at the evaluation point when an arbitrary region on design data of a circuit pattern is used for an addressing point; and a determination step of determining the imaging recipe and the measurement recipe based on the acceptable value of the imaging point displacement amount at the evaluation point and the estimated value of the imaging position displacement amount at the evaluation point.
NISHIURA TOMOFUMI
MATSUOKA RYOICHI
MOROKUMA HIDETOSHI
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