To provide an immersion member capable of suppressing the occurrence of an exposure defect.
The immersion member holds liquid between the member and an object so that an optical path of exposure light applied to the object is filled with the liquid to form an immersion space. The immersion member includes: a first face which is arranged at least on a part of the periphery of the optical path, and to which the object can be opposed; a second face arranged so as to form a first aperture between the second face and the first face at least in a part of the periphery of the first face; a third face arranged so as to be connected to the outer edge of the first face and turned to the outside about a radiation direction of the optical path; and a first recovery port arranged opposite to the third face to recover the liquid flowing into from the first aperture where a size of a gap between the third face and the first recovery port in the radiation direction is larger than the size of the first aperture.
| JPS6370520 | POSITIONING DEVICE |
| JP2005311001 | LIQUID MATERIAL SUPPLY UNIT AND METHOD THEREFOR |
| JPH08335624 | ROTARY TYPE WAFER TREATING APPARATUS |
Tadashi Takahashi
Kazuya Nishi
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