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Patent Searching and Data


Title:
IMPACT-RESISTANT POLYPHENYLENE ETHER RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS61223054
Kind Code:
A
Abstract:

PURPOSE: The titled composition having improved molding and processing properties, and improved impact resistance, especially low-temperature impact resistance, obtained by blending polyphenylene ether resin with a specific block copolymer resin and elastomer.

CONSTITUTION: (A) Polyphenylene ether resin is blended with (B) an A-B-A' type block copolymer resin (in A-B-A', A and A' are polymerized vinyl aromatic hydrocarbon block, B is polymerized conjugated diene hydrocarbon block, and molecular weight of block B is smaller than combined molecular weight of blocks A and A') and (C) elastomer. Poly(2,6-dimethyl-1,4-phenylene)ether, etc. is preferable as the component A. A polystyrene-polybutadiene-polystyrene type block copolymer, etc. are used as the component A. An acrylic acid ester graft copolymer, etc. are used as the component C.


Inventors:
Sugio, Akitoshi
Okabe, Katsuro
Kobayashi, Toshihiko
Application Number:
JP1985000065795
Publication Date:
October 03, 1986
Filing Date:
March 29, 1985
Export Citation:
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Assignee:
MITSUBISHI GAS CHEM CO INC
International Classes:
C08L71/00; C08L7/00; C08L9/06; C08L21/00; C08L23/00; C08L33/00; C08L33/02; C08L51/00; C08L51/02; C08L53/00; C08L53/02; C08L67/00; C08L71/12; C08L77/00; C08L101/00; (IPC1-7): C08L53/02; C08L71/04