Title:
IMPRINT APPARATUS, IMPRINT METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2020043160
Kind Code:
A
Abstract:
To provide an imprint apparatus, an imprint method, and a semiconductor device manufacturing method that can appropriately adjust the magnification of a template.SOLUTION: According to an embodiment, there is provided an imprint apparatus including a holding unit and a magnification adjusting unit. The holding unit holds a template. The template has a first surface and a second surface. The second surface is a surface opposite to the first surface. The template has a pedestal portion on the first surface. The magnification adjusting unit is arranged at a position corresponding to the pedestal on the second surface side of the template and not in contact with the template.SELECTED DRAWING: Figure 1
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Inventors:
FUKUHARA KAZUYA
Application Number:
JP2018167679A
Publication Date:
March 19, 2020
Filing Date:
September 07, 2018
Export Citation:
Assignee:
KIOXIA CORP
International Classes:
H01L21/027; B29C59/02
Attorney, Agent or Firm:
Sakai International Patent Office