Title:
インプリント装置、インプリント方法、及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP7222811
Kind Code:
B2
Abstract:
An imprint device includes a load port for receiving a substrate to be processed, a sensor that acquires information from the substrate about a film on the substrate, and a primer forming unit configured to receive the substrate from the load port. A controller is configured to select primer process conditions corresponding to the film information. The primer forming unit receives primer process conditions from the controller and forms a primer layer on the substrate over the film. The primer layer is formed according to the selected process conditions. An imprinting unit of the imprint device is configured to receive the substrate from the primer forming unit and perform imprint lithography on the substrate.
Inventors:
Kasumi Okabe
Hirokazu Kato
Kobayashi Kei
Muzo Daizo
Hirokazu Kato
Kobayashi Kei
Muzo Daizo
Application Number:
JP2019104681A
Publication Date:
February 15, 2023
Filing Date:
June 04, 2019
Export Citation:
Assignee:
Kioxia Co., Ltd.
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| JP2020161635A | ||||
| JP2009503139A | ||||
| JP2009508165A | ||||
| JP10294276A |
Attorney, Agent or Firm:
Takuya Takahashi
Keiichi Kobayashi
Masaaki Kurita
Keiichi Kobayashi
Masaaki Kurita
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