Title:
インプリント装置、および物品製造方法
Document Type and Number:
Japanese Patent JP6818522
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an imprint device advantageous in terms of robustness of alignment between a mold and a substrate.SOLUTION: An imprint device (1a) for forming a pattern on a substrate by contact of a mold with an imprint material on the substrate, has a control system including a holding section (15) for holding one of the substrate and the mold, a drive section (12b) for moving the holding section, a first measurement section (20) for measuring the position of the holding section, and a second measurement section (6) for measuring the positional deviation amount of the substrate and the mold. In a first period when the positional deviation amount exceeds a threshold level during contact, the control system performs first control for controlling the drive section based on the output from the first measurement section and a first target value, and second control for controlling an offset value added to a first target value based on the output from the second measurement section and a second target value, and in a second period when the positional deviation amount goes below the threshold level during contact, performs third control controlling the drive section based on the output from the second measurement section and a second target value, in place of the first control and second control.SELECTED DRAWING: Figure 1
Inventors:
Ryo Nawada
Application Number:
JP2016224473A
Publication Date:
January 20, 2021
Filing Date:
November 17, 2016
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| JP2015111657A | ||||
| JP2011129720A | ||||
| JP2012507173A | ||||
| JP20162668A | ||||
| JP2008244441A |
Foreign References:
| WO2011077584A1 |
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa
Sogo Kuroiwa