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Title:
IMPROVED MULTIPHASE MIXING DEVICE WITH STAGED GAS INTRODUCTION
Document Type and Number:
Japanese Patent JP2004237283
Kind Code:
A
Abstract:

To provide an improved multiphase mixing device with staged gas introduction.

A mixing system provides improved mixing of quench gas and process fluids in the interbed zone of limited height in a downflow reactor while minimizing pressure loss. The mixing system includes a horizontal collection tray, a mixing chamber positioned below the collection tray, at least one spillway passage for liquid and vapor flow extending through the collection tray into the mixing chamber, and a vapor slipstream passageway extending through the collection tray into the mixing chamber for directing a vapor slipstream from above the collection tray into the mixing chamber. The mixing chamber below the collection tray defines a two-phase mixing volume. The vapor slipstream passageway normally has a plurality of vapor inlets arranged to impart rotational movement to the vapor phase when it enters the mixing chamber. As a result of providing at least one additional passageway for a vapor slipstream, significant reacceleration of the vapor phase is achieved in the mixing chamber resulting in improvement in mixing efficiency of both the vapor and liquid phases.


Inventors:
MCDOUGALD NEIL K
BOYD SHERRI L
MULDOWNEY GREGORY P
Application Number:
JP2004027513A
Publication Date:
August 26, 2004
Filing Date:
February 04, 2004
Export Citation:
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Assignee:
EXXONMOBIL RES & ENG CO
International Classes:
B01J8/04; C10G49/00; B01J8/02; (IPC1-7): B01J8/02; B01J8/04
Domestic Patent References:
JPH03505992A1991-12-26
Foreign References:
US6180068B12001-01-30
Attorney, Agent or Firm:
Kenji Kawabi



 
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