Title:
IN-SITU LASER REDEPOSITION REDUCTION BY CONTROLLED GAS FLOW AND SYSTEM FOR REDUCING CONTAMINATION
Document Type and Number:
Japanese Patent JP2022151787
Kind Code:
A
Abstract:
To reduce deposition of debris generated by laser ablation of a workpiece disposed in a vacuum chamber by introducing background gas into the vacuum chamber prior to laser ablation or during laser ablation.SOLUTION: Background gas can be introduced diffusely into a vacuum chamber and can reduce contamination of surfaces such as a surface of an optical window that faces the workpiece during processing. Directed introduction of the background gas can be used as well as in some cases the same or different background gas is directed to a workpiece surface at the same or different pressure as pressure associated with diffuse introduction of the background gas to reduce contamination of the workpiece surface due to laser ablation debris.SELECTED DRAWING: Figure 1
Inventors:
TOMAS GANCARCIK
IVAN DEKAN
DAVID KROBOT
TOMAS TRNKOCY
STEVEN J RANDOLPH
REMCO GEURTS
IVAN DEKAN
DAVID KROBOT
TOMAS TRNKOCY
STEVEN J RANDOLPH
REMCO GEURTS
Application Number:
JP2022046224A
Publication Date:
October 07, 2022
Filing Date:
March 23, 2022
Export Citation:
Assignee:
FEI CO
International Classes:
B23K26/12; B23K15/00; B23K15/06; B23K26/142; H01J37/18; H01J37/28; H01J37/305
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Osamu Miyazaki
Tadahiko Ito
Osamu Miyazaki