Title:
Increased etching system productivity by managing polymers
Document Type and Number:
Japanese Patent JP6362670
Kind Code:
B2
Abstract:
Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.
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Inventors:
Chevy robert
Granados Alfredo
Demonte Peter
Chen Jiao H
One jean
Valesan Rajan
Granados Alfredo
Demonte Peter
Chen Jiao H
One jean
Valesan Rajan
Application Number:
JP2016500157A
Publication Date:
July 25, 2018
Filing Date:
January 06, 2014
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/3065; H01L21/31
Domestic Patent References:
| JP10149899A | ||||
| JP8321492A | ||||
| JP2005311357A | ||||
| JP5275379A | ||||
| JP2008311346A | ||||
| JP10163180A | ||||
| JP8124866A |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Nobuhiko Suzuki
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Nobuhiko Suzuki