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Patent Searching and Data


Title:
INDIUM METAL TARGET AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2011236445
Kind Code:
A
Abstract:

To provide an indium metal target capable of improving productivity by increasing a deposition rate (sputter rate) of sputtering in a deposition process of a light-absorbing layer of a thin film solar cell using a compound semiconductor, and a method for manufacturing the target.

In an indium metal target having a tetragonal crystal structure, the sputtering surface of the target is mainly oriented in the (101) plane. In a method for manufacturing an indium metal target, a metal ingot or a slab is prepared by melting and casting an indium metal raw material, and then a target is obtained by cold rolling the ingot or the slab in a sheet-shape, wherein the sputtering surface of the target is made to be mainly oriented in the (101) plane by the cold rolling.


Inventors:
MAEKAWA TAKAMASA
Application Number:
JP2010105938A
Publication Date:
November 24, 2011
Filing Date:
April 30, 2010
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP
International Classes:
C23C14/34; C22F1/16; C22C28/00; C22F1/00
Attorney, Agent or Firm:
Isamu Ogoshi