To provide an ultra-small infrared gas analyzer.
A first silicon wafer 10 which comprises holes 11 for gas diffusion on the surface and which comprises a waveguide-shaped meandered groove 12 on the rear surface, a second silicon wafer 20 which is provided with a hole 21, for light passage, formed so as to correspond to the side of one end part of the groove 12 and with an optical filter 22 formed so as to correspond to the side of the other end of the groove 12, which is bonded so as to block up the opening side of the groove 12 and which constitutes a cell 13 together with the first silicon substrate 10 and third silicon wafers 301, 302 which comprise a micro infrared light source 31 in a position corresponding to the hole 21 for light passage and which form a thin-film infrared sensor array 32 in a position corresponding to the optical filter 22 are overlapped in this order so as to be bonded, and an analytical part X is formed. The a nalytical part X is mounted on a stem Y, and a gas analyzer of a one-chip type is formed.
IHI HIROYUKI
TOMITA KATSUHIKO
