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Title:
INFRARED LIGHT-LOW REFLECTING PROCESSED WOVEN OR KNITTED FABRIC
Document Type and Number:
Japanese Patent JP2006176941
Kind Code:
A
Abstract:

To provide a camouflage processed woven or knitted fabric which can achieve an objective infrared light region reflectance without deteriorating the hand of the fabric.

A method for producing a camouflage processed woven or knitted fabric comprises plainly dyeing a woven or knitted fabric comprising polyamide fibers or a woven or knitted fabric comprising polyester fibers and containing polyamide fibers uniformly distributed in the woven or knitted fabric with a sulfur dye not containing a sulfide and a reducing agent and not having the double bond of sulfur to obtain the woven or knitted fabric exhibiting an infrared light reflectance of ≤65% in an infrared light wavelength region of 600 to 1,200 nm, and further dyeing the woven or knitted fabric comprising the polyamide fibers with an acidic dye and a pigment or dyeing the woven or knitted fabric comprising the polyester fibers and containing the polyamide fibers uniformly distributed in the woven or knitted fabric with a disperse dye and a pigment into a camouflage pattern exhibiting infrared light reflectance at multi-stages.


Inventors:
Ishimura, Hiromichi
Tanaka, Kingo
Application Number:
JP2004000373668
Publication Date:
July 06, 2006
Filing Date:
December 24, 2004
Export Citation:
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Assignee:
SEIREN CO LTD
International Classes:
D06P3/82; C09K3/00; D03D11/00; D04B1/00; D06P1/30; D06P3/04; D06P5/00