Title:
INFRARED LIGHT SENSITIVE ETCHING OR PLATING RESIST
Document Type and Number:
Japanese Patent JP2001324803
Kind Code:
A
Abstract:
To provide an infrared light sensitive etching or plating resist having high sensitivity, excellent in stability and not requiring an oxygen intercepting film.
The infrared light sensitive etching or plating resist contains a (meth)acrylate monomer having ethylene oxide and/or propylene oxide as a structural unit, an infrared absorbing dye and a polymerization initiator.
Inventors:
TAKASAKI RYUICHIRO
Application Number:
JP2000141085A
Publication Date:
November 22, 2001
Filing Date:
May 15, 2000
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
G03F7/027; C08F2/44; C08F2/46; C08F4/52; C08F20/30; C08F290/06; C08K5/00; C08L71/00; G03F7/004; G03F7/029; H05K3/06; (IPC1-7): G03F7/027; C08F2/44; C08F2/46; C08F4/52; C08F20/30; C08F290/06; C08K5/00; C08L71/00; G03F7/004; G03F7/029; H05K3/06
Attorney, Agent or Firm:
Hasegawa Moji