Title:
INFRARED RAY PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2016031816
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an infrared ray processing method for applying infrared ray energy while two materials contained in a target are provided with priority levels.SOLUTION: Infrared ray to be applied to a coating film 82 containing first and second materials is made different between a step (a) when the coating film 82 is passed through a first processing space 12a and then a step (b) when the coating film is passed through a second processing space 12a. In the step (a), infrared ray energy is preferentially applied to the first material of the first and second materials in the coating film 82. In the step (b), infrared ray energy is applied to the second material in the coating film 82. Accordingly, the second material can be evaporated in the step (b) after the first material is evaporated to increase the concentration of the second material in the coating film 82 in the step (a).SELECTED DRAWING: Figure 1
Inventors:
AOKI MICHIRO
KONDO YOSHIO
FUJITA TAKEKI
KONDO YOSHIO
FUJITA TAKEKI
Application Number:
JP2014153186A
Publication Date:
March 07, 2016
Filing Date:
July 28, 2014
Export Citation:
Assignee:
NGK INSULATORS LTD
International Classes:
H05B3/10; F26B23/04
Domestic Patent References:
| JP2000093885A | 2000-04-04 | |||
| JPH10335047A | 1998-12-18 | |||
| JPH11118354A | 1999-04-30 |
Attorney, Agent or Firm:
Aitec International Patent Office
Previous Patent: 複素環化合物
Next Patent: DESIGN METHOD OF HIGH FREQUENCY ELECTRON GUN AND HIGH FREQUENCY ELECTRON GUN
Next Patent: DESIGN METHOD OF HIGH FREQUENCY ELECTRON GUN AND HIGH FREQUENCY ELECTRON GUN