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Title:
INFRARED SENSOR, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC APPARATUS
Document Type and Number:
Japanese Patent JP2013057526
Kind Code:
A
Abstract:

To provide an infrared sensor whose support part having an infrared detector is positioned at a place facing to a recess and is prevented from adhering to a bottom of the recess.

An infrared sensor includes: a substrate 2; an insulating film 14 which is installed on the substrate 2 and which includes a recess 15 surrounding a cavity 17; a support part 23 which is supported by a beam 22 whose one end is fixed to the substrate 2 and which is positioned at a place facing to the cavity 17; and an infrared detector 4 which is installed on the support part 23 and which detects infrared. The recess 15 is covered by a water-repellent film 16 including polysilicon, and the beam 22 and the support part 23 include a silicon nitride or a silicon carbonitride.


Inventors:
MIYASHITA KAZUYUKI
Application Number:
JP2011194658A
Publication Date:
March 28, 2013
Filing Date:
September 07, 2011
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G01J1/02; H01L27/144; H01L27/146; H01L37/02; H04N5/225; G01J5/34; G01J5/48
Domestic Patent References:
JP2010127657A2010-06-10
JP2011153853A2011-08-11
JP2006099073A2006-04-13
JP2002361596A2002-12-18
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka