PURPOSE: To provide an inorganic film having excellent heat-resistance and high toughness, and suitable as an electrical insulation and heat-insulation film, by using a non-swelling synthetic mica having a specific chemical structural formula as a component.
CONSTITUTION: The objective inorganic film contains a non-swelling synthetic mica of formula I (X is inorganic cation having an ionic index of ≥1.25, e.g. K, Pb, Cs or Bi ion; Y is Mg2+ which may be partly substituted with Li+, Fe2+, Ni2+, Mn2+ or Al3+). The compound of formula I can be prepared by cleaving a restricted swelling synthetic mica of formula II (Z is Si4+ or Ge4+ which may be partly substiuted with Al3+, Fe3+ or B3+), carrying out the ion exchange of the interlaminar ions of the film with an inorganic cation having an ionic index if ≥1.25, and heat-treating the product at 350W900°C.
ANDOU AKITSUGU
ABE KOICHI
KAWAKAMI KENICHI
TORAY INDUSTRIES
JPS5320959A | 1978-02-25 |
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