To provide an inorganic polysilazane, small in the shrinkage in a firing step in an oxidant such as steam and hardly generating the crack of a silica film or peeling from a semiconductor substrate, and to provide a silica film-forming coating liquid containing inorganic polysilazane.
The silica film forming coating liquid contains the inorganic polysilazane, wherein in an 1H-NMR spectrum, when the peak area in the range of ≥4.75 and <5.4 ppm is expressed by A, the peak area in the range of ≥4.5 and <4.75 ppm is expressed by B and the peak area in the range of ≥4.2 and <4.5 ppm is expressed by C, the value of A/(B+C) is 0.9-1.5, the value of (A+B)/C is 4.2-50 and the mass average molecular weight expressed by polystyrene equivalent is 2,000-20,000.
KOBAYASHI JUN
YOKOTA HIROO
FURUHATA YASUHISA
| JP2011079917A | 2011-04-21 | |||
| JPH01138108A | 1989-05-31 | |||
| JPH05311120A | 1993-11-22 | |||
| JPS6316325B2 | 1988-04-08 | |||
| JPH10140087A | 1998-05-26 |
Hiromi Nakano
Fukatsu Yumiko
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