INSPECTION DATA ANALYSIS SYSTEM

Japanese Patent JP3284988

B2

PROBLEM TO BE SOLVED: To facilitate the management of defects with localization and the narrowing down on of the causing factors for the failure, by dividing a wafer into a plurality of designated areas and calculating the number or density of appearance failures in each divided region.
SOLUTION: An appearance failure data analyzing station is provided with such a function that has the arrangement information of chips on wafers by each type, discriminates chips on which detected appearance failures occur from the coordinates of the appearance defects, and counts the number of appearance failures which occur on each chip. When an analysis worker designates the article name, process, inspection data, and lot number of the article, the appearance failure data processing section 1110 of the appearance failure data analyzing station reads the lot number, wafer number, number of appearance failures number of chips inspected for the number of critical appearance failures, and inspection time into its internal memory 1118 from an appearance failure database 1111 and calculates the densities of appearance failures and critical appearance failures on each chip.

Seiji Ishikawa
Masao Sakata
Jun Nakazato
Sadao Shimosha
Hiroto Nagatomo
Yuzo Taniguchi
Osamu Sato
Tsutomu Okabe
Yuzaburo Sakamoto
Kimio Muramatsu
Kazuhiko Matsuoka
Taizo Hashimoto
Yuichi Ohyama
Hiroshi Ehara
Isao Miyazaki
Hidekazu Hanashima

JP34644898A

May 27, 2002

December 07, 1998

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株式会社日立製作所

H01L21/02; G01N21/956; H01L21/66; (IPC1-7): H01L21/66; G01N21/956; H01L21/02

JP59136942A
JP62213112A

Yasuo Sakuta

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