To inspect the flaw on a sample using both of transmitted light and reflected light and to perform inspection of good sensitivity by suppressing the loss of quantity of light accompanied by the space separation of the inspection visual field of a short wavelength optical system.
This inspection device for inspecting the flaw of a pattern is constituted so as to inspect the flaw of the pattern using the image of the pattern obtained by irradiating a sample to be measured having the pattern formed thereon with light. The inspection device is equipped with a first irradiation optical system for irradiating the pattern surface and opposite surface of the sample 6 with first inspection light with a wavelength λ, a first detection sensor 12 for detecting the transmitted light from the sample 6 irradiated with the first inspection light, a second irradiation optical system for irradiating the pattern surface of the sample 6 with second inspection light with the wavelength λ, a second detection sensor 17 for detecting the reflected light from the sample 6 irradiated with the second inspection light and a space separation mechanism 10 provided in the vicinity of the optical image forming space to the pattern surface of the sample 6 and separating the transmitted light and the reflected light from the sample 6 so as to obtain them from the visual field spatially separated in the observation visual field of the pattern.
WATANABE TOSHIYUKI
ISOMURA IKUNAO
SEKINE AKIHIKO
TOPCON CORP
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
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