Title:
基板を処理するプロセス装置の検査システム、およびこの検査システムのためのセンサ、ならびにプロセス装置の検査方法
Document Type and Number:
Japanese Patent JP4251814
Kind Code:
B2
Abstract:
The invention relates to an inspection system for process equipment for treating substrates, such as, for instance, semiconductor wafers or flat panel displays. The system is provided with a wireless sensor with which the interior of the process device can be inspected. The sensor is provided with a transmitter to transfer a signal, during inspection of the interior of the process device, to a receiver disposed outside the process device. The wireless sensor is arranged on a support having substantially the same dimensions as the substrates to be treated.
More Like This:
| WO/2021/046684 | MASS TRANSFER APPARATUS AND METHOD THEREFOR |
| WO/2017/193653 | SUBSTRATE PROCESSING EQUIPMENT |
| WO/2019/112903 | SYSTEM AND METHOD FOR EDGE RING WEAR COMPENSATION |
Inventors:
Yonkels, Otto Cornelis
Application Number:
JP2002070772A
Publication Date:
April 08, 2009
Filing Date:
March 14, 2002
Export Citation:
Assignee:
ASM International N.V.
International Classes:
H01L21/67; G01N7/02; H01L21/00; H01L21/205
Domestic Patent References:
| JP11329912A | ||||
| JP8079589A | ||||
| JP6066729A |
Attorney, Agent or Firm:
Keiichiro Saikyo
Takeshi Sugiyama
Minetarou Hirose
Takeshi Sugiyama
Minetarou Hirose