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Title:
INSTRUMENT AND METHOD FOR MEASURING X-RAY DIFFRACTION
Document Type and Number:
Japanese Patent JP2004251866
Kind Code:
A
Abstract:

To allow measurement in a short time, and to obtain 1μm or less of precise and high spatial resolution.

A spatial intensity distribution of an X-ray beam is recorded while magnifying the X-ray beam from a sample 1 unidirectionally or along two directions orthogonal each other, using at least one ASR crystal 3 having 50-150 times of magnification for magnifying a width of a diffracted X-ray beam (or transmitted X-ray beam), or the X-ray beam from the sample 1 is magnified, using an FZP 16, to record the spatial intensity distribution of the X-ray beam, or an X-ray image from the sample 1 is focused on the FZP 16 and is magnified unidirectionally or along the two directions orthogonal each other, using at least the one ASR crystal 3 to record the spatial intensity distribution of the X-ray beam. The FZP 16 may be substituted with a phase modulation type FZP applied with X-ray nontransmissible processing in a portion other than a Fresnel zone worked part, and light other than objective diffracted light may be shielded by a shielding means provided in the vicinity of a focal point of the FZP 16.


Inventors:
TANUMA RYOHEI
Application Number:
JP2003088686A
Publication Date:
September 09, 2004
Filing Date:
March 27, 2003
Export Citation:
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Assignee:
FUJI ELECTRIC HOLDINGS
International Classes:
G01N23/20; G21K1/06; (IPC1-7): G01N23/20; G21K1/06
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe