Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
干渉計測対象物による反射/散乱および透過ビームの、四半分角視野共時測定のための装置および方法。
Document Type and Number:
Japanese Patent JP2006516763
Kind Code:
A
Abstract:
An interferometery system for making interferometric measurements of an object, the system including: a beam generation module which during operation delivers an output beam that includes a first beam at a first frequency and a second beam at a second frequency that is different from the first frequency, the first and second beams within the output beam being coextensive, the beam generation module including a beam conditioner which during operation introduces a sequence of different shifts in a selected parameter of each of the first and second beams, the selected parameter selected from a group consisting of phase and frequency; a detector assembly having a detector element; and an interferometer constructed to receive the output beam at least a part of which represents a first measurement beam at the first frequency and a second measurement beam at the second frequency, the interferometer further constructed to image both the first and second measurement beams onto a selected spot on the object to produce therefrom corresponding first and second return measurement beams, and to then simultaneously image the first and second return measurement beams onto said detector element.

Inventors:
Hill, henry, allen
Application Number:
JP2006503046A
Publication Date:
July 06, 2006
Filing Date:
January 27, 2004
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Zete Tech Institute
International Classes:
G02B21/06; G01B9/02; G01B9/04; G02B17/08; G02B21/00; G02B21/14; G02B27/01; G02B27/10; A45D8/00
Domestic Patent References:
JPS62204103A1987-09-08
JPH039202A1991-01-17
JP2001343222A2001-12-14
Foreign References:
US6445453B12002-09-03
Attorney, Agent or Firm:
Takenori Hiroe
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio