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Patent Searching and Data


Title:
INTERFERENCE SPECTRUM REMOVING METHOD
Document Type and Number:
Japanese Patent JPH0694612
Kind Code:
A
Abstract:

PURPOSE: To facilitate the removal of interference spectrums in a short time by placing a sheet comprising a crystal material with no absorption in an infrared area on a thin film sample.

CONSTITUTION: A polystyrene thin film sample 8 on a silicon substrate 9 undergoes a reflection spectrum measurement with a Fourier transform infrared spectro photometer combining an infrared microscope. Reflected lights 4 and 5 respectively from the surface of the sample 8 and an interface surface between the sample 8 and the substrate 9 interfere with each other to generate an interference spectrum. A sheet made of alkali halide such as potassium bromide crystal sheet 6 is placed on the sample 8 to increase an apparent thickness of the sample. When adhesion between the sample 8 and the sheet 6 is poor, to prevent interference because of a clearance between the both, a fluid paraffin 7 is applied on the sheet 6 with a limited overlap between an infrared adsorption peak and other absorption peaks and then, the sheet 6 is put closely on the sample 8 to perform the reflection spectrum measurement. Thus, the interference spectrum is removed thereby enabling the obtaining of a reflection spectrum for the polystyrene 8 alone.


Inventors:
MIYAGAWA MASAYOSHI
MATSUI SHIGERU
SHIZUKUISHI KENICHI
Application Number:
JP24614192A
Publication Date:
April 08, 1994
Filing Date:
September 16, 1992
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01J3/42; G01J3/45; G01N21/27; G01N21/35; (IPC1-7): G01N21/35; G01J3/42; G01J3/45; G01N21/27
Attorney, Agent or Firm:
Ogawa Katsuo