Title:
潜伏性酸供与体としてのヨードニウム塩
Document Type and Number:
Japanese Patent JP4966446
Kind Code:
B2
Abstract:
Radiation-sensitive compositions comprising(a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or(a2) a compound that increases its solubility in a developer under the action of acid; and(b) at least one diaryliodonium salt of formula IX is branched C3-C20alkyl or C3-C8cycloalkyl;X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4;Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl;A- is a non-nucleophilic anion, selected from the group (BF4)-, (SbF6)-, (PF6)-, (B(C6F5))4-, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; andR1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen;with the proviso that the two phenyl rings on the iodine atom are not identically substituted.
Inventors:
Reinhard Schultz
Jean-Luc Bill Baume
Jean-Pierre Wolf
Stephan Irk
Hitoshi Yamato
Asakura Takakage
Jean-Luc Bill Baume
Jean-Pierre Wolf
Stephan Irk
Hitoshi Yamato
Asakura Takakage
Application Number:
JP2000385247A
Publication Date:
July 04, 2012
Filing Date:
December 19, 2000
Export Citation:
Assignee:
Ciba Holding Inc.
International Classes:
C07C25/18; C07C17/00; C08F2/50; C08G59/68; C08G65/10; G03F7/004; G03F7/029; G03F7/038; G03F7/039
Domestic Patent References:
| JP7179511A | ||||
| JP9179305A | ||||
| JP11149162A |
Foreign References:
| WO1998046647A1 | ||||
| WO1999005181A1 |
Attorney, Agent or Firm:
Hajime Tsukuni
Fumio Shinoda
Fumio Shinoda