Title:
イオンビーム装置
Document Type and Number:
Japanese Patent JP7221405
Kind Code:
B2
Abstract:
An object of the invention is to provide an ion beam device that can measure structures existing at different positions in a thickness direction of a sample. The ion beam device according to the invention irradiates a sample with an ion beam obtained by ionizing elements contained in a gas. After obtaining a first observation image of a first shape of a first region using a first ion beam, the ion beam device processes a hole in a second region of the sample using a second ion beam, and uses the first ion beam on the processed hole to obtain a second observation image of a second shape of the second region. By comparing the first observation image and the second observation image, a relative positional relation between the first shape and the second shape is obtained (refer to FIG. 7C).
Inventors:
Shinichi Matsubara
Masami Ikoda
Masami Ikoda
Application Number:
JP2021546066A
Publication Date:
February 13, 2023
Filing Date:
September 17, 2019
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/22; H01J37/08; H01J37/28; H01J37/317
Domestic Patent References:
| JP2015204181A | ||||
| JP2017021006A | ||||
| JP2011086606A | ||||
| JP51046062A | ||||
| JP2005108100A |
Foreign References:
| WO2009020150A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Hiraki International Patent Office
Previous Patent: Circulating preheating coffee pot and its method of operation
Next Patent: In-manifest update event
Next Patent: In-manifest update event