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Title:
ION INJECTOR
Document Type and Number:
Japanese Patent JPS5583145
Kind Code:
A
Abstract:

PURPOSE: To prevent the mixing of unnecessary element into target thus to prevent the deterioration of the characteristic of element, by providing a slit made of silicon having an opening of predetermined area for determining the ion injection area into the target.

CONSTITUTION: The target 1 is a rotatable polygonal rod mountable with many sheets of specimens where a slit 4 constructed of silicon single crystal board having an opening 4' for determining the ion injection area and a slit for suppressing the secondary electron are located between the target 1 and the ion source. Said slit 4 is maintained to the ground potential to block a portion of ion beam from the ion source and to irradiate only such ion as passed through said opening 4' on the target 1 while has no blocking function on such ion beam as passed through the opening 4'. Consequently the mixing of unnecessary element into the target can be prevented.


Inventors:
INADA TSUGUO
SAKURAI TERUO
OKAMURA SHIGERU
Application Number:
JP15889478A
Publication Date:
June 23, 1980
Filing Date:
December 20, 1978
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
H01J37/317; C23C14/48; H01L21/265; (IPC1-7): C23C11/00; H01J37/317; H01L21/265