ION MILLING METHOD AND ITS DEVICE

Title:

ION MILLING METHOD AND ITS DEVICE

Document Type and Number:

Japanese Patent JP2000301353

Kind Code:

A

Abstract:

To provide an ion milling method and its device wherein a uniform and stable ion beam current is dram out of a large diameter ion source electrode and whereby working precision is improved even if a thermal deformation is generated in the large diameter ion source electrode.

In an ion source composed of a plasma chamber in which an introduced gas is made to be plasmatic and an ion source electrode in which ion is drawn out of the plasma chamber, the electrode is respectively divided as a means for forming it into the large diameter, each block of the divided electrode is combined and independent, a gap formed between the divided adjacent blocks is closed by cross shaped pressing metal fittings 11, 12 and moreover a gap between an acceierative electrode 6 and a decelerative electrode 7 in the central part of the electrode is connected by an insulating spacer.

Inventors:

HIYOSHI YASUO
TANIGUCHI HITOSHI
SASAKI SHINJI
OKAWA TAKAKO
OISHI SEITARO

Application Number:

JP11427999A

Publication Date:

October 31, 2000

Filing Date:

April 22, 1999

Export Citation:

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Assignee:

HITACHI LTD

International Classes:

H01J27/08; B23K15/00; C23F4/00; H01J37/08; H01J37/317; H01L21/302; H01L21/3065; (IPC1-7): B23K15/00; C23F4/00; H01J27/08; H01J37/08; H01J37/317; H01L21/3065

Attorney, Agent or Firm:

Akio Takahashi (1 person outside)

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