Title:
ION SELECTIVE ELECTRODE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2022083860
Kind Code:
A
Abstract:
To provide an ion selective electrode that exhibits sufficient durability and a manufacturing method for the same.SOLUTION: Provided is an ion selective electrode that includes an ion sensitive layer containing an ion sensitive substance and a solid matter, with at least a portion of the surface of the solid matter being covered with the ion sensitive layer. The ion sensitive substance contains a crown ether structure composed of at least two or more repeating units that are expressed by formula (a): -CR1R2-CR3X-O- (where, X is an organic group having an alkoxysilyl group at a terminal, R1, R2 and R3 are hydrogen or hydrocarbon groups, R1 or R2 and X may be bound), with at least some of the alkoxysilyl groups of the crown ether structure being bound upon reaction to at least a portion of the surface of the solid matter.SELECTED DRAWING: Figure 2B
More Like This:
Inventors:
TOYODA KEI
Application Number:
JP2020195433A
Publication Date:
June 06, 2022
Filing Date:
November 25, 2020
Export Citation:
Assignee:
PANASONIC IP MAN CORP
International Classes:
G01N27/333
Attorney, Agent or Firm:
Michiko Matsutani
Yamato Kento
Yamato Kento
Previous Patent: Optical sensors and electronic devices
Next Patent: Chemical cells and their manufacturing methods
Next Patent: Chemical cells and their manufacturing methods