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Patent Searching and Data


Title:
ION SOURCE DEVICE
Document Type and Number:
Japanese Patent JPS5525943
Kind Code:
A
Abstract:

PURPOSE: To continuously obtain the mass spectrum of a material with lower vapor pressure or a material with higher polarity by standing semiconductor emitter around the opening of base substance and by supplying liquid sample continuously by means of a sample feeder.

CONSTITUTION: The semiconductor emitter E is a multiplicity of silicon whiskers 1a stood on the circumference of the opening of metal pipe 1. The pipe is provided with a sample feeder S, a liquid sample to be ionized can be supplied through the opening of pipe. A cylinder 14 as a sample reservoir is attached to the other end of pipe, a piston 15 is put in the cylinder, a heater 16 is embeded in the wall of cylinder, the sample is continuously fed by heating. In this way, the mass spectrum can be obtained continously.


Inventors:
Matsuo, Takekiyo
Koukuse, Masao
Matsuda, Hisashi
Application Number:
JP1978000098575
Publication Date:
February 25, 1980
Filing Date:
August 12, 1978
Export Citation:
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Assignee:
UNIV OSAKA
International Classes:
G01N27/62; H01J1/02; H01J49/16; (IPC1-7): G01N27/62; H01J1/30; H01J49/16