Title:
IONIC RADIATION SENSITIVE NEGATIVE TYPE RESIST
Document Type and Number:
Japanese Patent JPS5518473
Kind Code:
A
Abstract:
PURPOSE: An ionic radiation sensitive negative type resist that is composed of a polymer obtained mainly from a specific vinyl ether monomer, thus being good at sensitivity and etching resistance.
CONSTITUTION: A polymer from at least one selected from vinyl ether monomers of the formula or copolymer thereof with other vinyl monomers is dissolved in an adequate solvent.
Inventors:
KATOU HIROHISA
SAEKI HIDEO
TADA TSUKASA
SAEKI HIDEO
TADA TSUKASA
Application Number:
JP9237478A
Publication Date:
February 08, 1980
Filing Date:
July 28, 1978
Export Citation:
Assignee:
CHO LSI GIJUTSU KENKYU KUMIAI
International Classes:
G03F7/038; C08F16/00; C08F16/06; C08F16/14; C08F28/00; C08F28/04; H01L21/312; H05K3/06; (IPC1-7): C08F16/06; C08F16/14; C08F28/04; G03C1/68; H01L21/312; H05K3/06