Title:
平版投影装置用の照射源
Document Type and Number:
Japanese Patent JP4195071
Kind Code:
B2
Abstract:
A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle 10 constructed and arranged to eject a primary gas or liquid 15 in a first direction; a supply 11 for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle 10 and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser 30 for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle 20 constructed and arranged to eject a secondary gas or liquid 25 in the first direction and positioned aside, possibly enclosing, the primary jet nozzle 10; and a supply 21 for the secondary gas or liquid.
Inventors:
Henrik, Feedro Wicks
Frederik, Bjürk
Cornelis Cornella, De Bruiyun
Andruzeyu, Baltnik
Konstantin Nikolaevich, Koshereb
Badim Jevgeniewich, Vanine
Frederik, Bjürk
Cornelis Cornella, De Bruiyun
Andruzeyu, Baltnik
Konstantin Nikolaevich, Koshereb
Badim Jevgeniewich, Vanine
Application Number:
JP2007155698A
Publication Date:
December 10, 2008
Filing Date:
June 12, 2007
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G21K5/00; H05H1/24; B01J19/08; G03F7/20; H01L21/027; H05G2/00; H05H1/06; G21K5/08
Domestic Patent References:
| JP10319195A | ||||
| JP6060996A | ||||
| JP2001311799A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki