Title:
RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNIFORMITIES
Document Type and Number:
Japanese Patent JP2023106400
Kind Code:
A
Abstract:
To provide improved photolithography systems and methods using a digital micromirror device (DMD).SOLUTION: The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the "off" position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the "off" position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.SELECTED DRAWING: Figure 4
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Inventors:
JOSEPH R JOHNSON
THOMAS L LAIDIG
CHRISTOPHER DENNIS BENCHER
THOMAS L LAIDIG
CHRISTOPHER DENNIS BENCHER
Application Number:
JP2023071987A
Publication Date:
August 01, 2023
Filing Date:
April 26, 2023
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
G03F7/20
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation
Previous Patent: JPWO2023106399
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