KIT COMPRISING ACIDIC COMPOSITION AND COMPOSITION BASED ON HYDROXYALKYLUREA

Title:

KIT COMPRISING ACIDIC COMPOSITION AND COMPOSITION BASED ON HYDROXYALKYLUREA

Document Type and Number:

Japanese Patent JP2008001702

Kind Code:

A

Abstract:

To provide a kit comprising an acidic composition and a composition based on a hydroxyalkylurea.

The skincare and/or scalp-care kit comprises (1) a composition A and (2) a composition B. (1) The composition A comprises a physiologically acceptable acidic medium and at least one skincare agent and/or a scalp-care agent. (2) The composition B is packaged separately from the composition A and contains a physiologically acceptable basic medium and at least one hydroxyalkylurea represented by formula (I) (wherein, R1, R2, R3 and R4 represent each independently a hydrogen atom, a 1-4C alkyl group or a 2-6C hydroxyalkyl group optionally containing 1-5 hydroxy groups; and at least one of R1 to R4 groups represents a hydroxyalkyl group) and a salt thereof, a solvate thereof and an isomer thereof.

Inventors:

FONOLLA MORENO ANGELES
PIOT BERTRAND

Application Number:

JP2007163102A

Publication Date:

January 10, 2008

Filing Date:

June 20, 2007

Export Citation:

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Assignee:

OREAL

International Classes:

A61K8/42; A45D34/00; A61Q9/02; A61Q19/00; B65D81/32

Attorney, Agent or Firm:

Masatake Shiga
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro

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