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Title:
FRIT FOR HIGHLY CHEMICAL RESISTANT ENAMEL CAPABLE OF LOW TEMPERATURE BAKING
Document Type and Number:
Japanese Patent JP3193001
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a frit for a highly chemical resistant enamel contg. no harmful material, ensuring high gloss persistence of the enamel after a chemical resistance test and capable of low temp. baking at ≤530°C.
SOLUTION: This frit contains, by weight, 50-65% P2O5, 0% Sb2O3 or <5% Sb2O3, 3-8% Al2O3, 0.5-4.6% B2O3, 9 to <15%, in total, of one or more selected from Na2O, K2O and Li2O, 9-18%, in total, of one or more selected form ZnO, BaO and CaO and 3-4.5%, in total, of one or more selected from TiO2, SiO2 and ZrO2.


Inventors:
Yasumasa Fukushima
Masato Kumagai
Kyoko Hamahara
Toshihide Suzuki
Koji Watanabe
Hiroshi Nagaishi
Fusao Togashi
Application Number:
JP36789197A
Publication Date:
July 30, 2001
Filing Date:
December 27, 1997
Export Citation:
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Assignee:
Kawasaki Steel Co., Ltd.
Kawatetsu Building Materials Co., Ltd.
International Classes:
C03C8/08; C23D5/00; (IPC1-7): C03C8/08; C23D5/00
Domestic Patent References:
JP383836A
JP63230537A
JP1141835A
JP11139847A
JP643256B2
Attorney, Agent or Firm:
Eiichi Kobayashi



 
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