Title:
ＬＰガス残量管理方法、ＬＰガス残量管理システムおよびＬＰガス残量管理用コンピュータプログラム
Document Type and Number:
Japanese Patent JP7077035
Kind Code:
B2
Abstract:
To propose a LP gas residual management method capable of managing LP gas residual more precisely than before.SOLUTION: A management device 42 comprises: a vaporizing degree calculation function 49 for calculating the correlation between combination of temperature and LP gas usage flow rate per unit time (or combination of temperature, LP gas usage flow rate and gas composition) and the vaporizing degree; and a residual quantity calculation function 50 for calculating the residual quantity of a LP gas container 24 per unit time using the calculated vaporizing degree. In the vaporizing degree calculation function 49, each time the LP gas container 24 is replaced, the correlation is reviewed so that the error weight ΔW between the actual residual gas weight and the calculated residual gas flow rate is minimized, and it will be possible to gradually increase the accuracy of the at the LP gas consumption place and to perform proper LP gas replacement work.SELECTED DRAWING: Figure 2
Inventors:
Yasuhide Tsuchida
Application Number:
JP2018019658A
Publication Date:
May 30, 2022
Filing Date:
February 06, 2018
Export Citation:
Assignee:
Toyo Keiki Co., Ltd.
International Classes:
G01F1/00; F17C13/02; G01F3/22; G01F15/02; G01F15/06; G01F15/075; G06Q50/06; G08C15/00
Domestic Patent References:
| JP2010048617A | ||||
| JP2012189108A | ||||
| JP2005283127A | ||||
| JP2007322195A |
Attorney, Agent or Firm:
Shiro Yokozawa