To provide a laminate polishing pad in which a polishing layer and a cushion layer are hardly peeled off from each other.

The laminate polishing pad comprises a polishing layer having no transfixing region and a cushion layer which are laminated via an adhesion member. In the laminate polishing pad, on the back surface of the polishing layer, at least one non-adhesive region X is formed which is continuous from the center area to the outer peripheral edge of the polishing layer, and/or in the adhesion member, at least one non-adhesive area Y is formed which is continuous from the center area to the outer peripheral edge of the adhesive member.